An electron beam induced study in fluorine doped ZnO nanostructures for optical filtering and frequency conversion application

Albin Antony, P. Poornesh, K. Ozga, P. Rakus, A. Wojciechowski, I. V. Kityk, Ganesh Sanjeev, Vikash Chandra Petwal, Vijay Pal Verma, Jishnu Dwivedi

Research output: Contribution to journalArticle

Abstract

Influence of high energy electron beam treatment on fluorine doped ZnO (FZO) nanostructures and its role in modifying structural, optical, morphological and nonlinear optical properties was studied. FZO nanostructures were grown with different fluorine concentration using an air assisted chemical spray pyrolysis technique. The prepared nanostructures were treated with 8 MeV electron beam line at pre-determined dosages (5 kGy. 10 kGy, 15 kGy and 20 kGy). Compositional and chemical state analysis of FZO films were analyzed by x-ray photoelectron spectroscopy (XPS). The XPS analysis conveys that the percentage area ratio of O 1s core level spectra which attributes to oxygen vacancy defects are reduced from 28.9% to 13.7% which endorses a fact that e-beam treatment suppresses the generation of oxygen related defects. The glancing angle X-ray diffraction (GAXRD) study confirms that the deposited films exhibit a single phase which point towards the higher order structural stability and phase purity of FZO nanostructures in intense radiation environment. The ambient temperature PL spectra show quenching of radiative defect centers upon electron beam irradiation which infers that non radiative recombination predominates the radiative recombination in the nanostructures upon e-beam treatment. Open aperture Z-scan analysis shows a magnitude of nonlinear absorption coefficient β eff in the order of 10 −1 esu. Enhanced third harmonic generation signal (THG) shown by the films due to photoexcitation and relaxation process endorses the credibility of the grown films for application as UV light emitters.

Original languageEnglish
Pages (from-to)519-530
Number of pages12
JournalOptics and Laser Technology
Volume115
DOIs
Publication statusPublished - 01-07-2019

Fingerprint

Fluorine
frequency converters
fluorine
Electron beams
Nanostructures
electron beams
radiative recombination
Photoelectron spectroscopy
Defects
x ray spectroscopy
defects
photoelectron spectroscopy
X rays
Core levels
Spray pyrolysis
Photoexcitation
structural stability
Relaxation processes
oxygen
Oxygen vacancies

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Antony, Albin ; Poornesh, P. ; Ozga, K. ; Rakus, P. ; Wojciechowski, A. ; Kityk, I. V. ; Sanjeev, Ganesh ; Petwal, Vikash Chandra ; Verma, Vijay Pal ; Dwivedi, Jishnu. / An electron beam induced study in fluorine doped ZnO nanostructures for optical filtering and frequency conversion application. In: Optics and Laser Technology. 2019 ; Vol. 115. pp. 519-530.
@article{6f1804cfdea9419ea980d48e1212a45c,
title = "An electron beam induced study in fluorine doped ZnO nanostructures for optical filtering and frequency conversion application",
abstract = "Influence of high energy electron beam treatment on fluorine doped ZnO (FZO) nanostructures and its role in modifying structural, optical, morphological and nonlinear optical properties was studied. FZO nanostructures were grown with different fluorine concentration using an air assisted chemical spray pyrolysis technique. The prepared nanostructures were treated with 8 MeV electron beam line at pre-determined dosages (5 kGy. 10 kGy, 15 kGy and 20 kGy). Compositional and chemical state analysis of FZO films were analyzed by x-ray photoelectron spectroscopy (XPS). The XPS analysis conveys that the percentage area ratio of O 1s core level spectra which attributes to oxygen vacancy defects are reduced from 28.9{\%} to 13.7{\%} which endorses a fact that e-beam treatment suppresses the generation of oxygen related defects. The glancing angle X-ray diffraction (GAXRD) study confirms that the deposited films exhibit a single phase which point towards the higher order structural stability and phase purity of FZO nanostructures in intense radiation environment. The ambient temperature PL spectra show quenching of radiative defect centers upon electron beam irradiation which infers that non radiative recombination predominates the radiative recombination in the nanostructures upon e-beam treatment. Open aperture Z-scan analysis shows a magnitude of nonlinear absorption coefficient β eff in the order of 10 −1 esu. Enhanced third harmonic generation signal (THG) shown by the films due to photoexcitation and relaxation process endorses the credibility of the grown films for application as UV light emitters.",
author = "Albin Antony and P. Poornesh and K. Ozga and P. Rakus and A. Wojciechowski and Kityk, {I. V.} and Ganesh Sanjeev and Petwal, {Vikash Chandra} and Verma, {Vijay Pal} and Jishnu Dwivedi",
year = "2019",
month = "7",
day = "1",
doi = "10.1016/j.optlastec.2019.03.003",
language = "English",
volume = "115",
pages = "519--530",
journal = "Optics and Laser Technology",
issn = "0030-3992",
publisher = "Elsevier Limited",

}

An electron beam induced study in fluorine doped ZnO nanostructures for optical filtering and frequency conversion application. / Antony, Albin; Poornesh, P.; Ozga, K.; Rakus, P.; Wojciechowski, A.; Kityk, I. V.; Sanjeev, Ganesh; Petwal, Vikash Chandra; Verma, Vijay Pal; Dwivedi, Jishnu.

In: Optics and Laser Technology, Vol. 115, 01.07.2019, p. 519-530.

Research output: Contribution to journalArticle

TY - JOUR

T1 - An electron beam induced study in fluorine doped ZnO nanostructures for optical filtering and frequency conversion application

AU - Antony, Albin

AU - Poornesh, P.

AU - Ozga, K.

AU - Rakus, P.

AU - Wojciechowski, A.

AU - Kityk, I. V.

AU - Sanjeev, Ganesh

AU - Petwal, Vikash Chandra

AU - Verma, Vijay Pal

AU - Dwivedi, Jishnu

PY - 2019/7/1

Y1 - 2019/7/1

N2 - Influence of high energy electron beam treatment on fluorine doped ZnO (FZO) nanostructures and its role in modifying structural, optical, morphological and nonlinear optical properties was studied. FZO nanostructures were grown with different fluorine concentration using an air assisted chemical spray pyrolysis technique. The prepared nanostructures were treated with 8 MeV electron beam line at pre-determined dosages (5 kGy. 10 kGy, 15 kGy and 20 kGy). Compositional and chemical state analysis of FZO films were analyzed by x-ray photoelectron spectroscopy (XPS). The XPS analysis conveys that the percentage area ratio of O 1s core level spectra which attributes to oxygen vacancy defects are reduced from 28.9% to 13.7% which endorses a fact that e-beam treatment suppresses the generation of oxygen related defects. The glancing angle X-ray diffraction (GAXRD) study confirms that the deposited films exhibit a single phase which point towards the higher order structural stability and phase purity of FZO nanostructures in intense radiation environment. The ambient temperature PL spectra show quenching of radiative defect centers upon electron beam irradiation which infers that non radiative recombination predominates the radiative recombination in the nanostructures upon e-beam treatment. Open aperture Z-scan analysis shows a magnitude of nonlinear absorption coefficient β eff in the order of 10 −1 esu. Enhanced third harmonic generation signal (THG) shown by the films due to photoexcitation and relaxation process endorses the credibility of the grown films for application as UV light emitters.

AB - Influence of high energy electron beam treatment on fluorine doped ZnO (FZO) nanostructures and its role in modifying structural, optical, morphological and nonlinear optical properties was studied. FZO nanostructures were grown with different fluorine concentration using an air assisted chemical spray pyrolysis technique. The prepared nanostructures were treated with 8 MeV electron beam line at pre-determined dosages (5 kGy. 10 kGy, 15 kGy and 20 kGy). Compositional and chemical state analysis of FZO films were analyzed by x-ray photoelectron spectroscopy (XPS). The XPS analysis conveys that the percentage area ratio of O 1s core level spectra which attributes to oxygen vacancy defects are reduced from 28.9% to 13.7% which endorses a fact that e-beam treatment suppresses the generation of oxygen related defects. The glancing angle X-ray diffraction (GAXRD) study confirms that the deposited films exhibit a single phase which point towards the higher order structural stability and phase purity of FZO nanostructures in intense radiation environment. The ambient temperature PL spectra show quenching of radiative defect centers upon electron beam irradiation which infers that non radiative recombination predominates the radiative recombination in the nanostructures upon e-beam treatment. Open aperture Z-scan analysis shows a magnitude of nonlinear absorption coefficient β eff in the order of 10 −1 esu. Enhanced third harmonic generation signal (THG) shown by the films due to photoexcitation and relaxation process endorses the credibility of the grown films for application as UV light emitters.

UR - http://www.scopus.com/inward/record.url?scp=85062614336&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85062614336&partnerID=8YFLogxK

U2 - 10.1016/j.optlastec.2019.03.003

DO - 10.1016/j.optlastec.2019.03.003

M3 - Article

VL - 115

SP - 519

EP - 530

JO - Optics and Laser Technology

JF - Optics and Laser Technology

SN - 0030-3992

ER -