Effect of annealing on the structural and nonlinear optical properties of ZnO thin films under cw regime

K. K. Nagaraja, S. Pramodini, P. Poornesh, H. S. Nagaraja

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

We report on the studies of the effects of annealing on the structural and third-order nonlinear optical properties of ZnO thin films deposited on quartz substrates by the RF magnetron sputtering technique. The films were annealed in the temperature range 400-1000 °C. The third-order nonlinear optical studies were carried out using the z-scan technique under continuous wave (cw) He-Ne laser irradiation at 633 nm wavelength. The effects of annealing on the structural properties were examined using x-ray diffraction and atomic force microscopy (AFM). The (0 0 2) preferred orientation increased with increase in annealing temperature up to 800 °C. The crystalline phases of SiO2 were observed at higher annealing temperatures. The appearance of an extraneous phase was confirmed by AFM images and optical transmittance spectra. The samples exhibited nonlinear absorption and nonlinear refraction under the experimental conditions. The negative sign of the nonlinear refractive index n2 indicated that the films exhibit self-defocusing property due to thermal nonlinearity. The nonlinear refractive index n2, the nonlinear absorption coefficient βeff and the third-order optical susceptibility χ(3) were found to be of the highest orders. The estimated value of third-order optical susceptibility χ(3) was of the order of 10-3 esu. Multiple diffraction rings were observed when the samples were exposed to the laser beam. The appearance of rings was due to the refractive index change and thermal lensing. With increase in laser intensity, the variations of the self-diffraction ring patterns were studied experimentally. The films also exhibited strong optical limiting properties under cw laser excitation, and reverse saturable absorption was the dominant process leading to the observed nonlinear behaviour.

Original languageEnglish
Article number055106
JournalJournal of Physics D: Applied Physics
Volume46
Issue number5
DOIs
Publication statusPublished - 06-02-2013

Fingerprint

continuous radiation
Optical properties
Annealing
optical properties
Thin films
Refractive index
annealing
Diffraction
refractivity
thin films
rings
Atomic force microscopy
atomic force microscopy
magnetic permeability
Quartz
Laser excitation
Continuous wave lasers
thermal lensing
continuous wave lasers
defocusing

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

Cite this

@article{b083663c6cc24d1291aff7face84a206,
title = "Effect of annealing on the structural and nonlinear optical properties of ZnO thin films under cw regime",
abstract = "We report on the studies of the effects of annealing on the structural and third-order nonlinear optical properties of ZnO thin films deposited on quartz substrates by the RF magnetron sputtering technique. The films were annealed in the temperature range 400-1000 °C. The third-order nonlinear optical studies were carried out using the z-scan technique under continuous wave (cw) He-Ne laser irradiation at 633 nm wavelength. The effects of annealing on the structural properties were examined using x-ray diffraction and atomic force microscopy (AFM). The (0 0 2) preferred orientation increased with increase in annealing temperature up to 800 °C. The crystalline phases of SiO2 were observed at higher annealing temperatures. The appearance of an extraneous phase was confirmed by AFM images and optical transmittance spectra. The samples exhibited nonlinear absorption and nonlinear refraction under the experimental conditions. The negative sign of the nonlinear refractive index n2 indicated that the films exhibit self-defocusing property due to thermal nonlinearity. The nonlinear refractive index n2, the nonlinear absorption coefficient βeff and the third-order optical susceptibility χ(3) were found to be of the highest orders. The estimated value of third-order optical susceptibility χ(3) was of the order of 10-3 esu. Multiple diffraction rings were observed when the samples were exposed to the laser beam. The appearance of rings was due to the refractive index change and thermal lensing. With increase in laser intensity, the variations of the self-diffraction ring patterns were studied experimentally. The films also exhibited strong optical limiting properties under cw laser excitation, and reverse saturable absorption was the dominant process leading to the observed nonlinear behaviour.",
author = "Nagaraja, {K. K.} and S. Pramodini and P. Poornesh and Nagaraja, {H. S.}",
year = "2013",
month = "2",
day = "6",
doi = "10.1088/0022-3727/46/5/055106",
language = "English",
volume = "46",
journal = "Journal Physics D: Applied Physics",
issn = "0022-3727",
publisher = "IOP Publishing Ltd.",
number = "5",

}

Effect of annealing on the structural and nonlinear optical properties of ZnO thin films under cw regime. / Nagaraja, K. K.; Pramodini, S.; Poornesh, P.; Nagaraja, H. S.

In: Journal of Physics D: Applied Physics, Vol. 46, No. 5, 055106, 06.02.2013.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Effect of annealing on the structural and nonlinear optical properties of ZnO thin films under cw regime

AU - Nagaraja, K. K.

AU - Pramodini, S.

AU - Poornesh, P.

AU - Nagaraja, H. S.

PY - 2013/2/6

Y1 - 2013/2/6

N2 - We report on the studies of the effects of annealing on the structural and third-order nonlinear optical properties of ZnO thin films deposited on quartz substrates by the RF magnetron sputtering technique. The films were annealed in the temperature range 400-1000 °C. The third-order nonlinear optical studies were carried out using the z-scan technique under continuous wave (cw) He-Ne laser irradiation at 633 nm wavelength. The effects of annealing on the structural properties were examined using x-ray diffraction and atomic force microscopy (AFM). The (0 0 2) preferred orientation increased with increase in annealing temperature up to 800 °C. The crystalline phases of SiO2 were observed at higher annealing temperatures. The appearance of an extraneous phase was confirmed by AFM images and optical transmittance spectra. The samples exhibited nonlinear absorption and nonlinear refraction under the experimental conditions. The negative sign of the nonlinear refractive index n2 indicated that the films exhibit self-defocusing property due to thermal nonlinearity. The nonlinear refractive index n2, the nonlinear absorption coefficient βeff and the third-order optical susceptibility χ(3) were found to be of the highest orders. The estimated value of third-order optical susceptibility χ(3) was of the order of 10-3 esu. Multiple diffraction rings were observed when the samples were exposed to the laser beam. The appearance of rings was due to the refractive index change and thermal lensing. With increase in laser intensity, the variations of the self-diffraction ring patterns were studied experimentally. The films also exhibited strong optical limiting properties under cw laser excitation, and reverse saturable absorption was the dominant process leading to the observed nonlinear behaviour.

AB - We report on the studies of the effects of annealing on the structural and third-order nonlinear optical properties of ZnO thin films deposited on quartz substrates by the RF magnetron sputtering technique. The films were annealed in the temperature range 400-1000 °C. The third-order nonlinear optical studies were carried out using the z-scan technique under continuous wave (cw) He-Ne laser irradiation at 633 nm wavelength. The effects of annealing on the structural properties were examined using x-ray diffraction and atomic force microscopy (AFM). The (0 0 2) preferred orientation increased with increase in annealing temperature up to 800 °C. The crystalline phases of SiO2 were observed at higher annealing temperatures. The appearance of an extraneous phase was confirmed by AFM images and optical transmittance spectra. The samples exhibited nonlinear absorption and nonlinear refraction under the experimental conditions. The negative sign of the nonlinear refractive index n2 indicated that the films exhibit self-defocusing property due to thermal nonlinearity. The nonlinear refractive index n2, the nonlinear absorption coefficient βeff and the third-order optical susceptibility χ(3) were found to be of the highest orders. The estimated value of third-order optical susceptibility χ(3) was of the order of 10-3 esu. Multiple diffraction rings were observed when the samples were exposed to the laser beam. The appearance of rings was due to the refractive index change and thermal lensing. With increase in laser intensity, the variations of the self-diffraction ring patterns were studied experimentally. The films also exhibited strong optical limiting properties under cw laser excitation, and reverse saturable absorption was the dominant process leading to the observed nonlinear behaviour.

UR - http://www.scopus.com/inward/record.url?scp=84872513908&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84872513908&partnerID=8YFLogxK

U2 - 10.1088/0022-3727/46/5/055106

DO - 10.1088/0022-3727/46/5/055106

M3 - Article

VL - 46

JO - Journal Physics D: Applied Physics

JF - Journal Physics D: Applied Physics

SN - 0022-3727

IS - 5

M1 - 055106

ER -