Effect of electron beam on structural, linear and nonlinear properties of nanostructured Fluorine doped ZnO thin films

Albin Antony, S. Pramodini, I. V. Kityk, M. Abd-Lefdil, A. Douayar, F. Cherkaoui El Moursli, Ganesh Sanjeev, K. B. Manjunatha, P. Poornesh

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Electron beam induced effects on Fluorine doped ZnO thin films (FZO) grown by chemical spray pyrolysis deposition technique were studied. The samples were exposed to 8 MeV electron beam at different dose rate ranging from 1 kGy to 4 kGy. All films exhibit a polycrystalline nature which shows an increase in crystallanity with irradiation dosages. The electron beam irradiation effectively controls the films surface morphology and its linear optical characteristics. Z-Scan technique was employed to evaluate the sign and magnitude of nonlinear refractive index and nonlinear absorption coefficient using a continuous wave laser at 632.8 nm as light source. Enhancement in the third order nonlinear optical properties was were noted due to electron beam irradiation. Tailoring the physical and NLO properties by electron beam, the FZO thin films becomes a promising candidate for various optoelectronic applications such as phase change memory devices, optical pulse compression, optical switching and laser pulse narrowing.

Original languageEnglish
Pages (from-to)190-195
Number of pages6
JournalPhysica E: Low-Dimensional Systems and Nanostructures
Volume94
DOIs
Publication statusPublished - 01-10-2017

Fingerprint

Fluorine
fluorine
Electron beams
electron beams
Thin films
thin films
Irradiation
irradiation
Laser pulses
Phase change memory
dosage
Pulse compression
Continuous wave lasers
Spray pyrolysis
pulse compression
continuous wave lasers
optical switching
Optoelectronic devices
Surface morphology
pyrolysis

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

Cite this

Antony, Albin ; Pramodini, S. ; Kityk, I. V. ; Abd-Lefdil, M. ; Douayar, A. ; Cherkaoui El Moursli, F. ; Sanjeev, Ganesh ; Manjunatha, K. B. ; Poornesh, P. / Effect of electron beam on structural, linear and nonlinear properties of nanostructured Fluorine doped ZnO thin films. In: Physica E: Low-Dimensional Systems and Nanostructures. 2017 ; Vol. 94. pp. 190-195.
@article{a59c868c023842949b097569cbe1df2f,
title = "Effect of electron beam on structural, linear and nonlinear properties of nanostructured Fluorine doped ZnO thin films",
abstract = "Electron beam induced effects on Fluorine doped ZnO thin films (FZO) grown by chemical spray pyrolysis deposition technique were studied. The samples were exposed to 8 MeV electron beam at different dose rate ranging from 1 kGy to 4 kGy. All films exhibit a polycrystalline nature which shows an increase in crystallanity with irradiation dosages. The electron beam irradiation effectively controls the films surface morphology and its linear optical characteristics. Z-Scan technique was employed to evaluate the sign and magnitude of nonlinear refractive index and nonlinear absorption coefficient using a continuous wave laser at 632.8 nm as light source. Enhancement in the third order nonlinear optical properties was were noted due to electron beam irradiation. Tailoring the physical and NLO properties by electron beam, the FZO thin films becomes a promising candidate for various optoelectronic applications such as phase change memory devices, optical pulse compression, optical switching and laser pulse narrowing.",
author = "Albin Antony and S. Pramodini and Kityk, {I. V.} and M. Abd-Lefdil and A. Douayar and {Cherkaoui El Moursli}, F. and Ganesh Sanjeev and Manjunatha, {K. B.} and P. Poornesh",
year = "2017",
month = "10",
day = "1",
doi = "10.1016/j.physe.2017.08.015",
language = "English",
volume = "94",
pages = "190--195",
journal = "Physica E: Low-Dimensional Systems and Nanostructures",
issn = "1386-9477",
publisher = "Elsevier",

}

Effect of electron beam on structural, linear and nonlinear properties of nanostructured Fluorine doped ZnO thin films. / Antony, Albin; Pramodini, S.; Kityk, I. V.; Abd-Lefdil, M.; Douayar, A.; Cherkaoui El Moursli, F.; Sanjeev, Ganesh; Manjunatha, K. B.; Poornesh, P.

In: Physica E: Low-Dimensional Systems and Nanostructures, Vol. 94, 01.10.2017, p. 190-195.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Effect of electron beam on structural, linear and nonlinear properties of nanostructured Fluorine doped ZnO thin films

AU - Antony, Albin

AU - Pramodini, S.

AU - Kityk, I. V.

AU - Abd-Lefdil, M.

AU - Douayar, A.

AU - Cherkaoui El Moursli, F.

AU - Sanjeev, Ganesh

AU - Manjunatha, K. B.

AU - Poornesh, P.

PY - 2017/10/1

Y1 - 2017/10/1

N2 - Electron beam induced effects on Fluorine doped ZnO thin films (FZO) grown by chemical spray pyrolysis deposition technique were studied. The samples were exposed to 8 MeV electron beam at different dose rate ranging from 1 kGy to 4 kGy. All films exhibit a polycrystalline nature which shows an increase in crystallanity with irradiation dosages. The electron beam irradiation effectively controls the films surface morphology and its linear optical characteristics. Z-Scan technique was employed to evaluate the sign and magnitude of nonlinear refractive index and nonlinear absorption coefficient using a continuous wave laser at 632.8 nm as light source. Enhancement in the third order nonlinear optical properties was were noted due to electron beam irradiation. Tailoring the physical and NLO properties by electron beam, the FZO thin films becomes a promising candidate for various optoelectronic applications such as phase change memory devices, optical pulse compression, optical switching and laser pulse narrowing.

AB - Electron beam induced effects on Fluorine doped ZnO thin films (FZO) grown by chemical spray pyrolysis deposition technique were studied. The samples were exposed to 8 MeV electron beam at different dose rate ranging from 1 kGy to 4 kGy. All films exhibit a polycrystalline nature which shows an increase in crystallanity with irradiation dosages. The electron beam irradiation effectively controls the films surface morphology and its linear optical characteristics. Z-Scan technique was employed to evaluate the sign and magnitude of nonlinear refractive index and nonlinear absorption coefficient using a continuous wave laser at 632.8 nm as light source. Enhancement in the third order nonlinear optical properties was were noted due to electron beam irradiation. Tailoring the physical and NLO properties by electron beam, the FZO thin films becomes a promising candidate for various optoelectronic applications such as phase change memory devices, optical pulse compression, optical switching and laser pulse narrowing.

UR - http://www.scopus.com/inward/record.url?scp=85028057519&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85028057519&partnerID=8YFLogxK

U2 - 10.1016/j.physe.2017.08.015

DO - 10.1016/j.physe.2017.08.015

M3 - Article

VL - 94

SP - 190

EP - 195

JO - Physica E: Low-Dimensional Systems and Nanostructures

JF - Physica E: Low-Dimensional Systems and Nanostructures

SN - 1386-9477

ER -