Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films

O. S. Panwar, Mohd Alim Khan, Mahesh Kumar, S. M. Shivaprasad, B. S. Satyanarayana, P. N. Dixit, R. Bhattacharyya, M. Y. Khan

Research output: Contribution to journalArticle

39 Citations (Scopus)

Abstract

The application of a sufficiently high negative substrate bias, during the growth of tetrahedral amorphous carbon (ta-C), is usually associated with low sp3 bonding configuration and stressed films. However, in an effort to understand and utilize the higher pseudo thermo dynamical conditions during the film growth, at high negative substrate bias (- 300 V), reported here is a study on ta-C films grown under different hydrogen and nitrogen concentration. As grown ta-C films were studied under different negative substrate bias conditions. The variation of the sp3 content and sp3/sp2 ratio in the ta-C films exhibits a trend similar to those reported in literature, with a subtle variation in this report being the substrate bias voltage, which was observed to be around - 200 V, for obtaining the highest sp3 (80%) bonding and sp3/sp2 (3.95) ratio. The hydrogen and nitrogen incorporated ta-C films studied, at a bias of - 300 V, show an increase in sp3 (87-91%) bonding and sp3/sp2 (7-10) ratio in the range of studies reported. The inference is drawn on the basis of the set of data obtained from measurements carried out using X-ray photoelectron spectroscopy, X-ray induced Auger electron spectroscopy and Raman spectroscopy of as grown and hydrogen and nitrogen incorporated ta-C films deposited using an S bend filtered cathodic vacuum arc system. The study indicates the possibility of further tailoring ta-C film properties and also extending capabilities of the cathodic arc system for developing carbon based films for electronics and tribological applications.

Original languageEnglish
Pages (from-to)2331-2340
Number of pages10
JournalThin Solid Films
Volume516
Issue number8
DOIs
Publication statusPublished - 29-02-2008
Externally publishedYes

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Hydrogen
Nitrogen
arcs
Vacuum
nitrogen
vacuum
carbon
Substrates
hydrogen
Film growth
Auger electron spectroscopy
Bias voltage
Raman spectroscopy
Electronic equipment
Carbon
X ray photoelectron spectroscopy
inference

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Panwar, O. S., Khan, M. A., Kumar, M., Shivaprasad, S. M., Satyanarayana, B. S., Dixit, P. N., ... Khan, M. Y. (2008). Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films. Thin Solid Films, 516(8), 2331-2340. https://doi.org/10.1016/j.tsf.2007.09.024
Panwar, O. S. ; Khan, Mohd Alim ; Kumar, Mahesh ; Shivaprasad, S. M. ; Satyanarayana, B. S. ; Dixit, P. N. ; Bhattacharyya, R. ; Khan, M. Y. / Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films. In: Thin Solid Films. 2008 ; Vol. 516, No. 8. pp. 2331-2340.
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Panwar, OS, Khan, MA, Kumar, M, Shivaprasad, SM, Satyanarayana, BS, Dixit, PN, Bhattacharyya, R & Khan, MY 2008, 'Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films', Thin Solid Films, vol. 516, no. 8, pp. 2331-2340. https://doi.org/10.1016/j.tsf.2007.09.024

Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films. / Panwar, O. S.; Khan, Mohd Alim; Kumar, Mahesh; Shivaprasad, S. M.; Satyanarayana, B. S.; Dixit, P. N.; Bhattacharyya, R.; Khan, M. Y.

In: Thin Solid Films, Vol. 516, No. 8, 29.02.2008, p. 2331-2340.

Research output: Contribution to journalArticle

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T1 - Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films

AU - Panwar, O. S.

AU - Khan, Mohd Alim

AU - Kumar, Mahesh

AU - Shivaprasad, S. M.

AU - Satyanarayana, B. S.

AU - Dixit, P. N.

AU - Bhattacharyya, R.

AU - Khan, M. Y.

PY - 2008/2/29

Y1 - 2008/2/29

N2 - The application of a sufficiently high negative substrate bias, during the growth of tetrahedral amorphous carbon (ta-C), is usually associated with low sp3 bonding configuration and stressed films. However, in an effort to understand and utilize the higher pseudo thermo dynamical conditions during the film growth, at high negative substrate bias (- 300 V), reported here is a study on ta-C films grown under different hydrogen and nitrogen concentration. As grown ta-C films were studied under different negative substrate bias conditions. The variation of the sp3 content and sp3/sp2 ratio in the ta-C films exhibits a trend similar to those reported in literature, with a subtle variation in this report being the substrate bias voltage, which was observed to be around - 200 V, for obtaining the highest sp3 (80%) bonding and sp3/sp2 (3.95) ratio. The hydrogen and nitrogen incorporated ta-C films studied, at a bias of - 300 V, show an increase in sp3 (87-91%) bonding and sp3/sp2 (7-10) ratio in the range of studies reported. The inference is drawn on the basis of the set of data obtained from measurements carried out using X-ray photoelectron spectroscopy, X-ray induced Auger electron spectroscopy and Raman spectroscopy of as grown and hydrogen and nitrogen incorporated ta-C films deposited using an S bend filtered cathodic vacuum arc system. The study indicates the possibility of further tailoring ta-C film properties and also extending capabilities of the cathodic arc system for developing carbon based films for electronics and tribological applications.

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