Fabrication and characterization of ZnO/AI/ZnO multilayers by simultaneous DC and RF magnetron sputtering

K. K. Nagaraja, A. Santhosh Kumar, H. S. Nagaraja

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The present investigation reports the fabrication and characterization of multilayered transparent electrodes by simultaneous DC and RF magnetron sputtering on glass substrates. The multilayer structure consists of three layers (ZnO/Al/ZnO). The influence of Al layer thickness on the electrical and optical properties was investigated. Optimum thickness of Al was determined for high transmittance and good electrical conductivity. High quality films having resistance as low as 25 Ω/sq with optical transmittance upto 65% were obtained at room temperature.

Original languageEnglish
Article number012071
JournalIOP Conference Series: Materials Science and Engineering
Issue number1
Publication statusPublished - 01-01-2015
EventInternational Conference on Materials Science and Technology, ICMST 2012 - Kerala, India
Duration: 10-06-201214-06-2012


All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)

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