This paper reports on micro-pattering of Indium thin film (donor substrate) using a higher deposition dose than previously reported. The threshold deposition dose required for micro-patterning was measured. Ejected material from the micro-patterned thin film was deposited onto an accepter substrate kept in close proximity; it clearly shows deposition of micron and submicron particles of Indium. Moreover, a clean line like structure was deposited onto the accepter substrate when the accepter substrate was moved with the same velocity as that of the donor substrate.
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Electrical and Electronic Engineering