Microstructure and positron behavior in FeCl3 doped PVA/PVP blend

V. Ravindrachary; R. F. Bhajantri; A. Harisha; C. Ranganathaiah

doi:10.1002/pssc.200982128

Microstructure and positron behavior in FeCl3 doped PVA/PVP blend

V. Ravindrachary, R. F. Bhajantri, A. Harisha, Ismayil, C. Ranganathaiah

Department of Physics, Manipal Institute of Technology, Manipal

Research output: Contribution to journal › Conference article › peer-review

15 Citations (Scopus)

Abstract

We are reporting the positron behaviour in transition metal chloride FeCl3 doped PVA/PVP (50:50) blend. Pure and FeCl3 doped blend films were prepared using solution casting method and studied using X-ray Diffraction (XRD) and Positron Annihilation Lifetime Spectroscopy (PALS). XRD studies show that the doping increases the amorphous nature of the blend and the PALS studies reveal that the o-Ps lifetime (τ₃) and intensity (I₃) decreases with increase in FeCl₃ doping level. This is due to chemical quenching and inhibition process of Ps due to doping concentration, which are discussed in the text.

Original language	English
Pages (from-to)	2438-2441
Number of pages	4
Journal	Physica Status Solidi (C) Current Topics in Solid State Physics
Volume	6
Issue number	11
DOIs	https://doi.org/10.1002/pssc.200982128
Publication status	Published - 28-12-2009

All Science Journal Classification (ASJC) codes

Condensed Matter Physics

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10.1002/pssc.200982128

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title = "Microstructure and positron behavior in FeCl3 doped PVA/PVP blend",

abstract = "We are reporting the positron behaviour in transition metal chloride FeCl3 doped PVA/PVP (50:50) blend. Pure and FeCl3 doped blend films were prepared using solution casting method and studied using X-ray Diffraction (XRD) and Positron Annihilation Lifetime Spectroscopy (PALS). XRD studies show that the doping increases the amorphous nature of the blend and the PALS studies reveal that the o-Ps lifetime (τ3) and intensity (I3) decreases with increase in FeCl3 doping level. This is due to chemical quenching and inhibition process of Ps due to doping concentration, which are discussed in the text.",

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T1 - Microstructure and positron behavior in FeCl3 doped PVA/PVP blend

AU - Ravindrachary, V.

AU - Bhajantri, R. F.

AU - Harisha, A.

AU - Ismayil,

AU - Ranganathaiah, C.

PY - 2009/12/28

Y1 - 2009/12/28

N2 - We are reporting the positron behaviour in transition metal chloride FeCl3 doped PVA/PVP (50:50) blend. Pure and FeCl3 doped blend films were prepared using solution casting method and studied using X-ray Diffraction (XRD) and Positron Annihilation Lifetime Spectroscopy (PALS). XRD studies show that the doping increases the amorphous nature of the blend and the PALS studies reveal that the o-Ps lifetime (τ3) and intensity (I3) decreases with increase in FeCl3 doping level. This is due to chemical quenching and inhibition process of Ps due to doping concentration, which are discussed in the text.

AB - We are reporting the positron behaviour in transition metal chloride FeCl3 doped PVA/PVP (50:50) blend. Pure and FeCl3 doped blend films were prepared using solution casting method and studied using X-ray Diffraction (XRD) and Positron Annihilation Lifetime Spectroscopy (PALS). XRD studies show that the doping increases the amorphous nature of the blend and the PALS studies reveal that the o-Ps lifetime (τ3) and intensity (I3) decreases with increase in FeCl3 doping level. This is due to chemical quenching and inhibition process of Ps due to doping concentration, which are discussed in the text.

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Microstructure and positron behavior in FeCl3 doped PVA/PVP blend

Abstract

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