The third-order nonlinear optical properties of undoped and nitrogen-doped ZnO thin films were evaluated using the z-scan technique. The films were sputter-deposited on glass substrates using radio frequency power. The He-Ne continuous wave laser operating at 633 nm was used as an irradiation source. A change in the growth mode in the nitrogen-doped films was observed. The grain size and roughness were found to be dependent on the nitrogen concentration, as shown by atomic force microscopy analysis. The optical band gap was determined and found to increase with nitrogen concentration in the films. Both nonlinear absorption and refraction nonlinearities were exhibited by the deposited films. The nonlinear refractive index n2, the nonlinear absorption coefficient βeff and the third-order nonlinear optical susceptibility χ(3) were determined and found to be largest. Multiple diffraction ring patterns were observed when the samples were made to interact with the laser beam and were attributed to refractive index change and thermal lensing. Further, optical power-limiting experiments were performed to determine the optical-limiting threshold and clamping values for undoped and nitrogen-doped ZnO films.
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Industrial and Manufacturing Engineering