Study of micro-structural, optical and electrical properties of TiO2 films obtained from micro-controller based SILAR method

V. K. Ashith, Gowrish K. Rao, R. Smitha, Sahana N. Moger

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The TiO2 films were obtained from successive ion layer adsorption and reaction (SILAR) method. A micro-controller based SILAR unit was used to precisely monitor and control the deposition parameters. The films were uniform and free from physical defects such as pores and cracks. A maximum thickness of about 700 nm was achieved. The films were found to be polycrystalline without any texture or preferred orientations. The crystallite size of the films was found to increase with thickness while the micro strain and stress were found to reduce with the thickness. Post-deposition annealing was also found to produce the similar results. The films were found to possess an indirect bandgap of about 3 eV. Various technically important parameters such as root-mean-square micro strain, Urbach energy, chemical composition, carrier concentration, electrical resistivity etc. were determined. The effects of deposition parameters on the properties of the films is discussed in detail.

Original languageEnglish
Pages (from-to)17623-17629
Number of pages7
JournalCeramics International
Volume44
Issue number15
DOIs
Publication statusPublished - 15-10-2018

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Structural properties
Electric properties
Optical properties
Ions
Adsorption
Controllers
Crystallite size
Strain energy
Carrier concentration
Energy gap
Textures
Annealing
Cracks
Defects
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

@article{b8a74209551345679d98ab4cbf7eb2f5,
title = "Study of micro-structural, optical and electrical properties of TiO2 films obtained from micro-controller based SILAR method",
abstract = "The TiO2 films were obtained from successive ion layer adsorption and reaction (SILAR) method. A micro-controller based SILAR unit was used to precisely monitor and control the deposition parameters. The films were uniform and free from physical defects such as pores and cracks. A maximum thickness of about 700 nm was achieved. The films were found to be polycrystalline without any texture or preferred orientations. The crystallite size of the films was found to increase with thickness while the micro strain and stress were found to reduce with the thickness. Post-deposition annealing was also found to produce the similar results. The films were found to possess an indirect bandgap of about 3 eV. Various technically important parameters such as root-mean-square micro strain, Urbach energy, chemical composition, carrier concentration, electrical resistivity etc. were determined. The effects of deposition parameters on the properties of the films is discussed in detail.",
author = "Ashith, {V. K.} and Rao, {Gowrish K.} and R. Smitha and Moger, {Sahana N.}",
year = "2018",
month = "10",
day = "15",
doi = "10.1016/j.ceramint.2018.06.223",
language = "English",
volume = "44",
pages = "17623--17629",
journal = "Ceramics International",
issn = "0272-8842",
publisher = "Elsevier Limited",
number = "15",

}

Study of micro-structural, optical and electrical properties of TiO2 films obtained from micro-controller based SILAR method. / Ashith, V. K.; Rao, Gowrish K.; Smitha, R.; Moger, Sahana N.

In: Ceramics International, Vol. 44, No. 15, 15.10.2018, p. 17623-17629.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Study of micro-structural, optical and electrical properties of TiO2 films obtained from micro-controller based SILAR method

AU - Ashith, V. K.

AU - Rao, Gowrish K.

AU - Smitha, R.

AU - Moger, Sahana N.

PY - 2018/10/15

Y1 - 2018/10/15

N2 - The TiO2 films were obtained from successive ion layer adsorption and reaction (SILAR) method. A micro-controller based SILAR unit was used to precisely monitor and control the deposition parameters. The films were uniform and free from physical defects such as pores and cracks. A maximum thickness of about 700 nm was achieved. The films were found to be polycrystalline without any texture or preferred orientations. The crystallite size of the films was found to increase with thickness while the micro strain and stress were found to reduce with the thickness. Post-deposition annealing was also found to produce the similar results. The films were found to possess an indirect bandgap of about 3 eV. Various technically important parameters such as root-mean-square micro strain, Urbach energy, chemical composition, carrier concentration, electrical resistivity etc. were determined. The effects of deposition parameters on the properties of the films is discussed in detail.

AB - The TiO2 films were obtained from successive ion layer adsorption and reaction (SILAR) method. A micro-controller based SILAR unit was used to precisely monitor and control the deposition parameters. The films were uniform and free from physical defects such as pores and cracks. A maximum thickness of about 700 nm was achieved. The films were found to be polycrystalline without any texture or preferred orientations. The crystallite size of the films was found to increase with thickness while the micro strain and stress were found to reduce with the thickness. Post-deposition annealing was also found to produce the similar results. The films were found to possess an indirect bandgap of about 3 eV. Various technically important parameters such as root-mean-square micro strain, Urbach energy, chemical composition, carrier concentration, electrical resistivity etc. were determined. The effects of deposition parameters on the properties of the films is discussed in detail.

UR - http://www.scopus.com/inward/record.url?scp=85049322249&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85049322249&partnerID=8YFLogxK

U2 - 10.1016/j.ceramint.2018.06.223

DO - 10.1016/j.ceramint.2018.06.223

M3 - Article

AN - SCOPUS:85049322249

VL - 44

SP - 17623

EP - 17629

JO - Ceramics International

JF - Ceramics International

SN - 0272-8842

IS - 15

ER -