The deposition temperature and post-deposition heat treatment can be effectively used to fine tune the structure and composition of the films to obtain desired performance. In this paper, we have investigated the effect of elevated substrate temperature and post-deposition annealing (in air and vacuum) on the properties of ZnS films. Both the tools were found to produce considerable changes in the crystal structure of the films. The major impact was found to be an increase in crystallite size which effectively reduced the defects. Although a small amount of tensile stress was produced as a side-effect of heat treatment, the films remained structurally intact. The vacuum annealing was found to be far more productive than annealing in air. It produced nearly the same amount of improvement in the crystallite size, but with considerably less tensile stress. Furthermore, the bandgap of the films remained unaffected by vacuum annealing.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering